Maʻemaʻe kiʻekiʻe 99.95% Tungsten Sputtering Target
ʻAno a me ka nui
| inoa mea kūʻai | Pahu hoʻoheheʻe ʻia ʻo Tungsten(W-1). |
| Loaʻa Maʻemaʻe(%) | 99.95% |
| ʻano: | Papa, poepoe, rotary |
| Nui | Nui OEM |
| Ka helu hehee(℃) | 3407(℃) |
| Ka nui atomika | 9.53 knm3/mol |
| Māmā (g/cm³) | 19.35g/cm³ |
| Kaumaha wela o ke kū'ē | 0.00482 I/℃ |
| ʻO ka wela sublimation | 847.8 kJ/mol(25 ℃) |
| Wela huna o ka hehee | 40.13±6.67kJ/mol |
| kūlana ʻili | Holoi Polish a alkali paha |
| Noi: | Aerospace, hoʻoheheʻe ʻia ka honua, kumu kukui uila, nā mea hana kemika, nā mea lapaʻau, nā mīkini metala, hoʻoheheʻe. |
Nā hiʻohiʻona
(1) Ka ʻili maʻemaʻe me ka ʻole o ka pore, ka ʻōpala a me nā hemahema ʻē aʻe
(2) Ka wili ʻana a i ʻole ka lathing lihi, ʻaʻohe ʻoki ʻoki
(3) Unbeatable lerel o ka maemae waiwai
(4) Kiʻekiʻe ductility
(5) Homogeneous micro trucalture
(6) ʻO ka mākaʻikaʻi laser no kāu mea kūikawā me ka inoa, ka inoa, ka nui maʻemaʻe a pēlā aku
(7) ʻO kēlā me kēia pcs o ka sputtering target mai ka pauka mea waiwai & helu, hui ʻana i nā limahana, waho a me ka HIP manawa, ka mea mīkini a me nā kikoʻī kikoʻī ua hana ʻia iā mākou iho.
Nā noi
1. ʻO kahi ala nui e hana ai i nā mea kiʻiʻoniʻoni lahilahi ʻo ka sputtering - kahi ala hou o ka hoʻoheheʻe kino kino (PVD).ʻO ke kiʻiʻoniʻoni lahilahi i hana ʻia e ka pahuhopu e hōʻike ʻia e ke kiʻekiʻe kiʻekiʻe a me ka hoʻopili maikaʻi.I ka hoʻohana nui ʻia ʻana o nā ʻenehana sputtering magnetron, pono nui nā metala maʻemaʻe kiʻekiʻe a me nā pahu hao.Me ka helu hoʻoheheʻe kiʻekiʻe, elasticity, haʻahaʻa haʻahaʻa o ka hoʻonui ʻana i ka wela, ka resistivity a me ka paʻa wela maikaʻi, hoʻohana nui ʻia ka tungsten maʻemaʻe a me ka tungsten alloy i loko o ka semiconductor integrated circuit, hōʻike ʻelua-dimensional, solar photovoltaic, X ray tube a me ka ʻenehana honua.
2. Hiki iā ia ke hana me nā mea hoʻolālā sputtering kahiko a me nā mea hana hou loa, e like me ka uhi ʻāina nui no ka ikehu lā a i ʻole nā wahie a me nā noi flip-chip.
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