Pepa Tantalum
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Tantalum Sputtering Target – Disc
Hoʻohana nui ʻia ʻo Tantalum sputtering target i ka ʻoihana semiconductor a me ka ʻoihana uhi optical.Hana mākou i nā ʻano kikoʻī like ʻole o ka tantalum sputtering targets ma ke noi ʻana o nā mea kūʻai mai ka ʻoihana semiconductor a me ka ʻoihana optical ma o ka hoʻoheheʻe ʻana i ka umu EB.Ma muli o ka makaʻala i ke kaʻina hana ʻōwili kū hoʻokahi, ma o ka mālama paʻakikī a me ka mahana annealing pololei a me ka manawa, hana mākou i nā ʻano like ʻole o nā pahuhopu tantalum sputtering e like me nā pahuhopu disc, nā pahuhopu rectangular a me nā pahuhopu rotary.Eia kekahi, ke hōʻoiaʻiʻo nei mākou i ka maʻemaʻe tantalum ma waena o 99.95% a 99.99% a i ʻole;ʻo ka nui o ka palaoa ma lalo o 100um, ʻo ka pālahalaha ma lalo o 0.2mm a me ka Surface
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Pepa Tantalum (Ta)99.95%-99.99%
Hana ʻia nā Pepa Tantalum (Ta) mai nā ingots tantalum.Hana ʻia nā Pepa Tantalum (Ta) ma o Cold-Working Process, ma o ka forging, rolling, swaging, a me ke kaha kiʻi ʻana e loaʻa ai ka nui i makemake ʻia.
